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  • South Korea South Korea
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From cradle to grave for Mask (Reticle) management

This system does not simply integrate the data of the defect inspection equipment. It allows the user to perform all analyses related to Mask (Reticle) including changes in defect image before/after repair, sensitivity management for the inspection equipment (Verimask, SPICA), with only one UI..

01. Integrated DB storage of all defect-related results (including defect image)

  • Collect the results of all Defect Inspection Tool, Review & Repair Tool (including defect image) Store in the integrated DB of MaskManager (Optional function to transmit to the upstream system)

02. Productivity management for defect inspection equipment

  • Can calculate the time required for total inspection, re-inspection, and errors by work process CoO (Cost of Ownership) management including equipment productivity management

03. Analysis of various data (DSA, SPC, Control Chart, etc.)

  • Trend chart by manufacturing process/by equipment/by defect

04. Integration for analysis in connection with other products (MiDEWS, DataManager) for defect management solution

  • Allows analysis in connection with the repeated defect and mask defect of wafer FAB
    Allows paperless analysis for a variety of inspection reports when shipped out of MaskShop.

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